PHI nanoTOF 3+ Time-of-Flight SIMS
Product Overview
The PHI nanoTOF 3+ is an advanced TOF-SIMS instrument designed for high-precision surface analysis. It builds upon its predecessor by enhancing mass resolution, integrating automated measurement capabilities, and offering compatibility with complementary surface analysis techniques. This system is tailored for comprehensive chemical imaging and molecular structure analysis across various materials.
Key Features
- Enhanced Mass Analyzer: Utilizes a newly developed mass analyzer that improves mass resolution from m/Δm 12,000 to 15,000, allowing for clearer separation of previously indistinct peaks.
- Automated Measurements: Features automation of TOF-SIMS measurements, enabling continuous, unattended analysis. This is particularly beneficial for analyzing a wide range of materials, including inorganic materials like semiconductors and batteries, as well as organic materials like polymers and biological samples.
- Comprehensive Analysis Capability: Equipped with a new sample handling system that achieves full compatibility with XPS and AES instruments, facilitating comprehensive analysis. This system allows for sample transfer between surface analysis instruments while preventing exposure to the atmosphere, making it suitable for analyzing advanced materials like battery and catalyst samples.
- Parallel Imaging MS/MS (Optional): Offers the ability to acquire MS¹ and MS² data simultaneously in the same measurement field, providing detailed molecular structure information. This is achieved by combining a tandem mass spectrometer (MS²) with a conventional TOF-SIMS analyzer (MS¹).
- Unique Ion Beam Technology: Incorporates a pulsed argon ion gun for complete charge neutralization, facilitating low-damage depth profiling of organic materials. Additionally, cesium and oxygen ion guns are used for rapid depth profiling of inorganic materials.
Specifications
| Specification | Details |
|---|---|
| Mass Resolution | Up to m/Δm 15,000 (enhanced from 12,000) |
| Spatial Resolution | <500 nm (high mass resolution mode), <50 nm (high spatial resolution mode) |
| Sample Size Compatibility | Up to 100 mm × 100 mm |
| Sample Handling | Automated sample transfer system with built-in parking function |
| Ion Sources | Pulsed argon, cesium, and oxygen ion guns |
| Charge Neutralization | Achieved via pulsed argon ion gun |
| Depth Profiling Capability | Suitable for organic and inorganic materials |
| MS/MS Capability | Optional parallel imaging MS¹ and MS² acquisition |
| Software Platform | SmartSoft-TOF, unified interface for TOF-SIMS, XPS, and AES systems |
Applications
- Semiconductor Industry: Analyzing micro-contaminants and defects in electronic components.
- Battery Research: Investigating electrode materials and interfaces in lithium-ion batteries.
- Polymer Analysis: Characterizing surface compositions and contaminants in polymer materials.
- Biological Samples: Studying molecular structures and distributions in biological specimens.
- Catalyst Development: Examining surface chemistry and reactions in catalyst materials.
Resources
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