High-Performance XPS System for Advanced Surface Analysis
Product Overview
The Genesis PHI is designed for precise elemental and chemical state analysis of surfaces, interfaces, and thin films. Its advanced performance is the result of decades of innovation in XPS instrumentation. The system supports both conventional and high-throughput analysis, enabling users to explore micro-area chemistry, surface composition, and in-depth profiling with exceptional clarity and reliability.
Key Features
- High Spatial Resolution: Sub-micron XPS imaging for detailed chemical mapping
- Automated Multi-Area Analysis: Streamlined workflow with robotic sample handling and stage automation
- High Sensitivity & Throughput: Enhanced detection limits and faster data acquisition using a high-intensity X-ray source
- Dual Beam Depth Profiling: Optimized for both organic and inorganic materials
- User-Friendly Interface: Intuitive software environment designed to simplify complex analysis tasks
- In Situ Sample Transfer Options: Minimize contamination with optional inert environment transfer modules
Specifications
| Feature | Description |
|---|---|
| X-ray Source | Monochromatic Al Kα with high brightness and stability |
| Analyzer | Cylindrical mirror analyzer with multi-channel detection |
| Spatial Resolution (Imaging) | Less than 10 µm |
| Spatial Resolution (Spectroscopy) | Less than 5 µm (in microprobe mode) |
| Depth Profiling | Dual ion guns (argon gas cluster and monoatomic) |
| Vacuum System | Ultra-high vacuum (UHV) design for enhanced sensitivity |
Applications
- Semiconductor and microelectronics failure analysis
- Polymer and organic coatings characterization
- Battery interface and electrode surface studies
- Catalysts and corrosion products identification
- Biomedical device and pharmaceutical surface validation
- Advanced material development in aerospace and automotive sectors
Resources
PHI GENESIS DATA SHEET
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