PHI 710 Auger Electron Spectroscopy

PHI 710 Auger Electron Spectroscopy

Product Overview

The PHI 710 Scanning Auger Nanoprobe is a high-performance Auger Electron Spectroscopy (AES) instrument designed to provide elemental and chemical state information from sample surfaces, nano-scale features, thin films, and interfaces. It offers superior Auger imaging performance, spatial resolution, sensitivity, and spectral energy resolution, making it suitable for demanding AES applications.

 

Key Features

  • High Spatial Resolution: Achieves SEM resolution ≤ 3 nm and AES resolution ≤ 8 nm, enabling detailed analysis of nano-scale features. 
  • Acoustic Enclosure Box: Minimizes the effects of vibration, sound, and temperature changes, allowing Auger analysis at magnifications up to 500,000× under low-drift conditions. 
  • Coaxial Cylindrical Mirror Analyzer (CMA): PHI's unique electron spectrometer design captures Auger electrons emitted in 360 degrees from the sample, providing high sensitivity and reducing the impact of sample shape or tilt angle. 
  • Chemical State Mapping: Spectrum mapping capability maintains the spectrum for each pixel, enabling chemical state mapping images based on spectral analysis. 
  • Versatile Sample Support: Capable of analyzing various sample shapes without shadow effects, ensuring accurate understanding of the sample.

 

Specifications

Specification Details
SEM Spatial Resolution ≤ 3 nm
AES Spatial Resolution ≤ 8 nm (@ 20 kV, 1 nA)
Maximum Magnification Up to 500,000×
Analyzer Type Coaxial Cylindrical Mirror Analyzer (CMA)
Chemical State Mapping Spectrum mapping with per-pixel spectral data
Sample Compatibility Supports various shapes without shadow effects
Environmental Control Acoustic enclosure minimizes vibration, sound, and temperature fluctuations
Software Platform SmartSoft-AES with MultiPak Data Reduction Software

 

Applications

  • Nano-scale Surface Analysis: Ideal for analyzing small features, inclusions, and grain boundaries in materials like ductile cast iron. 
  • Thin Film and Interface Characterization: Provides detailed information on thin films and interfaces in semiconductor devices. 
  • Chemical State Mapping: Enables chemical state mapping of elements such as silicon in semiconductor chips, distinguishing between elemental Si, Si oxynitride, and metal silicide.
  • Versatile Material Analysis: Suitable for a wide range of materials, including metals, polymers, and ceramics, due to its high sensitivity and spatial resolution.

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