Advanced Spectroscopic Ellipsometer
Product Overview
The FilmTek™ 2000 SE by Bruker is a benchtop spectroscopic ellipsometer designed for precise thin film and multi-layer analysis. Equipped with an automated stage accommodating wafers up to 300 mm, it facilitates uniformity measurements across large substrates. Utilizing an advanced rotating compensator design, the FilmTek 2000 SE delivers exceptional measurement performance and speed for a wide range of thin film applications. Its sophisticated film modeling software and proprietary dispersion formulas enable accurate, real-time data processing, ensuring reliable results for both research and industrial environments.
Key Features
- Enhanced Sensitivity and Sample Range: Provides precise and repeatable measurements of refractive indices across various materials.
- Extended DUV-NIR Spectral Range: Covers wavelengths from 240 nm to 1700 nm, allowing data collection from diverse film materials and structures.
- Multimodal Ellipsometry/Reflectometry Design: Combines ellipsometry and reflectometry for comprehensive data acquisition with high accuracy and repeatability.
- Automated Stage with Autofocus: Supports efficient, user-friendly operation and accommodates wafers up to 300 mm.
- Advanced Material Modeling Software: Features Bruker's generalized material model with advanced global optimization algorithms for precise data analysis.
- Optional Generalized Ellipsometry: Offers a 4×4 matrix generalization method for anisotropy measurements (nx, ny, nz).
Specifications
| Specification | Details |
|---|---|
| Film Thickness Range | 0 Å to 150 µm |
| Film Thickness Accuracy | ±1.0 Å for NIST traceable standard oxide 100 Å to 1 µm |
| Spectral Range | 240 nm - 1700 nm (240 nm - 1000 nm is standard) |
| Measurement Spot Size | 3 mm |
| Sample Size | 2 mm - 300 mm (150 mm standard) |
| Spectral Resolution | 0.3 nm - 2 nm |
| Light Source | Regulated deuterium-halogen lamp (2,000 hrs lifetime) |
| Detector Type | 2048 pixel Sony linear CCD array / 512 pixel cooled Hamamatsu InGaAs CCD array (NIR) |
| Automated Stage with Auto Focus | 300 mm (200 mm is standard) |
| Computer | Multi-core processor with Windows™ 10 Operating System |
| Measurement Time | ~2 sec per site (e.g., oxide film) |
Applications
- Semiconductor and Dielectric Materials: Precise measurement of thin films used in semiconductor devices, ensuring optimal performance and reliability.
- LED/OLED Manufacturing: Evaluation of multilayer structures in LED/OLED production to enhance efficiency and color accuracy.
- Multilayer Optical Coatings: Analysis of complex optical coatings to achieve desired reflectance and transmittance properties.
- Optical Antireflection Coatings: Assessment of antireflection coatings to improve optical device performance by minimizing surface reflections.
- Electro-Optical Materials: Characterization of materials used in electro-optical applications to ensure consistency and quality.
- Computer Disks: Measurement of thin films on computer disks to maintain data integrity and storage efficiency.
- Coated Glass: Evaluation of coatings on glass substrates for applications in architecture, automotive, and display technologies.
- Thin Metals: Analysis of thin metal films used in various electronic and decorative applications.
- Solar Cells: Characterization of photovoltaic materials to enhance energy conversion efficiency in solar panels.
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